• Photopex UPE 2nm removal retention. Using dense membrane technology, to effectively remove easy-deformable contaminant.
  • Photopex Nylon 5nm removal retention. Using asymmetric membrane technology, to achieve higher flow rate and improve production operability. Using high purity PE structure and apply the ultra-clean technology to ensure filter's cleanliness.
  • Photopex Multi According to different application requirements, use Cobetter's know-how and experience to customize the product.
  • Photogile POU Filter for Lithography Process One-piece construction is easy to install, clean and replace this filter capsule